The MKS Paragon AX7710TES-03 is a high-performance, refurbished remote plasma source specifically designed for advanced semiconductor processing. Engineered for high gas dissociation rates (>95%) of NF₃, this unit supports gas flows up to 8 slm and pressures up to 10 Torr, making it ideal for chamber cleaning and process development in CVD, ALD, and ALE applications. Featuring EtherCAT® communication, it offers intelligent data streaming for enhanced process monitoring and diagnostics, ensuring peak efficiency and low cost of ownership.
The MKS Paragon AX7710TES-03 Remote Plasma Source stands as a cornerstone in the realm of semiconductor process equipment, particularly for the cleaning and preparation of CVD and ALD/ALE process chambers. Building upon the production-proven attributes of MKS's low-field toroidal plasma technology, the Paragon series has been meticulously engineered to deliver unparalleled gas dissociation efficiency and robust process control, addressing the critical need for ultra-clean surfaces and high-throughput cleaning cycles in modern semiconductor fabrication facilities.At the heart of this system lies a proprietary plasma block design, enhanced with a Plasma Electrolytic Oxidation (PEO) coating, which not only ensures low particle generation but also extends the operational lifespan of the plasma block. This is particularly crucial in environments where particle contamination can significantly impact device yields and reliability. The Paragon's ability to achieve >95% NF₃ dissociation at flows up to 8 slm translates to faster chamber clean times, enabling manufacturers to reduce cycle times and increase overall fab throughput.One of the standout features of the AX7710TES-03 is its intelligent data handling capability via EtherCAT® communication. This advanced protocol allows for real-time streaming of critical operating parameters, such as plasma power, gas flow rates, and pressure readings, directly to the tool or fab database. Such data integration is pivotal for Advanced Process Control (APC) and Fault Detection and Classification (FDC) applications, empowering users to monitor, modify, and optimize process parameters on-the-fly. This level of control not only enhances process repeatability but also supports predictive maintenance strategies, thereby reducing unexpected downtime and maintenance costs.The system is compatible with O₂ and NF₃ mixed gases, offering flexibility for various cleaning chemistries, and can be configured with either analog or EtherCAT communication ports. The analog port provides traditional control, while the EtherCAT port offers a high-speed data conduit for sophisticated process monitoring and control strategies. This dual-port configuration ensures that the Paragon can be seamlessly integrated into existing process lines, whether they rely on legacy control systems or modern digital architectures.In essence, the MKS Paragon AX7710TES-03 is not just a plasma source; it's a comprehensive cleaning solution that combines high-flow gas handling, exceptional dissociation efficiency, and smart data analytics. It's designed to meet the stringent demands of today's semiconductor manufacturing, where cleanliness, efficiency, and data-driven process control are paramount. By offering a refurbished, cost-effective solution without compromising on performance, this unit provides an optimal balance of cost and capability, making it a valuable addition to any advanced semiconductor processing facility.
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