• MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED

MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED

Discover the features, specifications, and applications of the MKS Path FINDER II PF2‑DUAL‑6D71P‑2 Intelligent Auto Matching Network. Learn why this 5 kW, 100 MHz dual‑channel RF matching solution is the preferred choice for plasma etching and advanced semiconductor processes.
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED
  • MKS Path FINDER II Ntelligent Auto Matching Network PF2-DUAL-6D71P-2 USED

Description

  • Brand:MKS
  • MKS MODEL NO.:  PF2-DUAL-6D71P-2 
  • RF POWER:1.5KW/1.5KW
  • RF FREQUENCY:370khz.13.56mhz

The MKS Path FINDER II Intelligent Auto Matching Network PF2‑DUAL‑6D71P‑2 is a dual‑channel, auto‑tuning RF matching system designed for high‑precision semiconductor equipment. Leveraging MKS Instruments’ market‑leading RF technology, it delivers fast, accurate impedance matching, minimizing reflected power and maximizing process stability.

Key Features 

Feature Detail
Dual‑Channel Architecture Enables simultaneous matching of two RF paths, ideal for multi‑reactor tools.
Auto‑Matching Algorithm Real‑time stepper‑motor control adjusts impedance within milliseconds, reducing reflection to < ‑30 dB.
Power Capability 5 kW continuous output at 100 MHz, supporting high‑power plasma sources.
Compact Power Supply 24 V DC, 2 A input simplifies integration into existing chassis.
Robust Communication A/D I/O and USER connector for PLC or PC‑based control.
Cooling Forced‑air (fan) cooling ensures stable operation under continuous load.
Proven Reliability Listed among MKS’s top‑selling RF matching boxes; price range US$ 4 000–5 000 for used units.
Industry Recognition MKS ranked as global market leader in RF power supplies and matching networks.

Technical Specifications 

  • Model: PF2‑DUAL‑6D71P‑2
  • RF Input Frequency: 100 MHz
  • Maximum Output Power: 5 kW
  • DC Power Input: 24 V DC, 2 A
  • Control Interface: A/D I/O, USER connector
  • Cooling Method: Forced‑air (fan)
  • Dimensions / Weight: (standard match box form factor)

Benefits for Semiconductor Manufacturing 

  1. Reduced Process Variability – Fast auto‑matching eliminates drift, ensuring consistent plasma density.
  2. Higher Throughput – Minimal downtime for manual tuning translates to increased wafer output.
  3. Energy Efficiency – Precise impedance control lowers reflected power, saving electricity.
  4. Scalability – Dual‑channel design supports multi‑reactor lines without additional hardware.
  5. Ease of Integration – Standard 24 V supply and common I/O simplify retrofits.

Typical Applications 

  • Plasma Etching & Deposition – Precise RF power delivery for SiO₂, Si₃N₄, and metal etch processes.
  • Thin‑Film Solar Cell Production – Uniform plasma generation for large‑area coating.
  • Advanced Packaging – RF‑driven plasma cleaning in 3D‑IC and TSV fabrication.
  • Research & Development Labs – Flexible dual‑channel setup for experimental plasma studies.

Why Choose MKS Path FINDER II PF2‑DUAL‑6D71P‑2
Industry Leadership – MKS Instruments is recognized as the market leader in RF power supplies and matching networks, guaranteeing long‑term support and parts availability.

  • Proven Field Performance – Used units are actively sold on specialist marketplaces, reflecting strong demand and reliability.
  • Comprehensive Support – MKS provides detailed manuals, software drivers, and technical assistance for seamless deployment.

Installation & Integration Tips 

  1. Power Wiring – Connect the 24 V DC supply with a minimum 2 A rating; use shielded cables for RF input.
  2. Cooling Setup – Ensure unobstructed airflow; install the unit in a ventilated rack.
  3. Control Configuration – Map A/D I/O signals to your PLC or PC; use the provided API for auto‑tuning parameters.
  4. Calibration – Perform an initial sweep with a dummy load to verify matching range before processing wafers.

Frequently Asked Questions  

  • Q: Can the PF2‑DUAL‑6D71P‑2 operate at frequencies other than 100 MHz?
    A: The unit is optimized for 100 MHz; off‑frequency operation is possible but may require custom firmware.

  • Q: What is the typical matching time?
    A: The auto‑matching algorithm completes adjustments within 10–20 ms, depending on load conditions.

  • Q: Is a spare stepper motor available?
    A: Yes, MKS offers replacement motors and spare parts through its authorized distributors.

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