MKS RPS ASTEX ASTRON e/ex (4-8L) AX7685-34 PN 27-425457-00 Used

• BRAND:MKS  
• MODEL:  ASTRON 4-8L
• MKS PN:AX7685-34  PN:27-425457-00
• CONDITION:USED

Key Technical Features

Performance Highlights

• High Radical Flux – The low‑field toroidal plasma block creates a uniform downstream radical stream, improving etch uniformity and film quality.
• Low Particle Contamination – Minimal sputtering of source walls reduces defectivity on processed wafers.
• Energy‑Efficient Operation – Optimized RF matching reduces power consumption while maintaining high dissociation rates.
• Scalable Gas Handling – Supports multiple gas mixes for customized chemistries (e.g., NF₃ + Ar for fluorine‑based cleaning).

Typical Applications

1. Chamber Cleaning & Surface Preparation – Fast removal of polymer residues and native oxides before deposition.
2. Pre‑Deposition Conditioning – Generates a clean, reactive surface for subsequent CVD/PVD steps.
3. Thin‑Film Deposition Support – Enhances nucleation and film adhesion in ALD and PECVD processes.
4. RIE & ICP Process Integration – Provides upstream plasma for downstream bias‑free etching.

Why Choose the AX7685‑34?

• Proven OEM Qualification – Meets AMAT and LAM specifications for high‑volume manufacturing.
• Compact Footprint – Fully self‑contained unit (≈ 400 mm × 350 mm × 310 mm) fits tight tool bays.
• Robust Service Network – Global MKS support, refurbishment, and spare‑part logistics ensure minimal downtime.